FIB 201: General FIB Usage
With Emphasis on Device Modification and Electrical Analysis

Description
This course is designed for beginning FIB users whose applications mainly involve design, debug, and electrical analysis on VLSI devices. It will familiarize students with the practical setup and usage of FIB systems with emphasis on microsurgery and electrical analysis, including column alignment, beam current calibration, end-point, secondary ion versus secondary electron imaging, accessing spare gates, CAD processing and usage, and etc. An overview of the FIB systems and basic theories will also be included.
Prerequisites
No prior knowledge of focused ion systems is required. Students should be somewhat familiar with the fundamentals of compute usage, basic UNIX, and basic silicon design terminologies and technologies.
Goals
Upon completion of this course, students will be able to:
Duration
5 days (30% lecture, 70% lab)

FIB 202: General FIB Usage
With Emphasis on Micro-machining

Description
This course is designed for beginning FIB users whose applications mainly involve micro-machining capabilities. It will familiarize students with the practical setup and usage of FIB systems with emphasis on micro-machining technologies, including column alignment, beam current calibration, X-section, TEM sample preparation, secondary ion versus secondary electron imaging, and etc. An overview of the FIB systems and basic theories will also be included.
Prerequisites
No prior knowledge of focused ion systems is required. Students should be somewhat familiar with the fundamentals of compute usage, basic UNIX, and basic silicon design terminologies and technologies.
Goals
Upon completion of this course, students will be able to:
Duration
5 days (30% lecture, 70% lab)